Controllable Layer-by-Layer Deposition of MoS₂ by Magnetron Sputtering

Zih-Siang Jian^1,2*, Wei-Chen Tseng¹, Jie-Ru Yen¹, Hsiang-Huan Lee¹, Wen-Hao Chang^1,2

¹Department of Electrophysics, National Yang Ming Chiao Tung University, Hsinchu, Taiwan
²Research Center for Applied Sciences, Academia Sinica, Taipei, Taiwan

* Presenter:Zih-Siang Jian, email:darke047.sc10@nycu.edu.tw

We demonstrate here a controllable layer-by-layer deposition of MoS₂ on a template of monolayer single-crystal MoS₂ by magnetron sputtering followed by thermal annealing in H₂S environments. By controlling the sputtering time, layer-control of MoS₂ has been achieved. Compared with direct sputtering of MoS₂ on sapphire, using monolayer MoS₂ as the template can significantly improve the uniformity and crystallinity of the sputtered MoS₂. The sputtered MoS₂ films have been examined by Raman, photoluminescence spectra, X-ray photoelectron spectroscopy and X-ray diffraction. The layer numbers have been identified by atomic force microscopy combined with Raman mode separation. The approach for MoS₂ layer-by-layer growth is scalable and applicable to selected-area layer engineering.

Keywords: Monolayer molybdenum disulfide, TMDs, 2D Semiconductor, Magnetron Sputtering, LPCVD