Surface Coating and Modification of Powder-Based Materials by Atomic Layer Deposition: From Ultrathin Films to Nanoparticles and Single Atoms

Hao Van Bui^1*

¹Materials Science and Engineering, Phenikaa University, Hanoi, Viet Nam

* Presenter:Hao Van Bui, email:hao.buivan@phenikaa-uni.edu.vn

Atomic layer deposition (ALD) is a gas-phase deposition technique in which precursors are introduced sequentially in pulses, separated by a purge of inert gas. In ALD, chemical reactions are split into two or more reacting steps and repeated in a cyclic manner. Importantly, the reactions are self-saturating, which is the unique feature that enables the capability of controlling the amount of deposited materials at the atomic level precision. Therefore, ALD has been applied in various fields, including microelectronics, optoelectronics, catalysis, sensors, and energy conversion, storage and utilization devices. In my presentation, I will introduce a scalable ALD technique for surface coating and modification of powder-based materials using a fluidized bed reactor (FBR) working at atmospheric pressure. I will demonstrate how to achieve ultrathin, conformal films and ultrasmall nanoparticles with FBR-ALD technique. Finally, I will discuss the potential applications of FBR-ALD in the synthesis of high-performance catalysts for various catalytic reactions, fuel cells, and batteries, as well as the applications in other important fields.

Keywords: Atomic Layer Deposition, Ultrathin films, Nanoparticles, Single atoms, Fluidized Bed Reactor